Research progress of renewable lithography material based on natural polymer and its lithography mechanism
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The National Natural Science Foundation of China (General Program, Key Program, Major Research Plan)

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    Abstract:

    Compared with the traditional lithography materials of petroleum raw materials, the new lithography materials based on natural polymers not only retain high-resolution lithography performance, but also have the advantages of renewable and non-toxic development. The classification, advantages and disadvantages of protein lithography materials and polysaccharide lithography materials in natural polymer lithography materials are systematically summarized in this article. Through in-depth research on the lithography mechanism of different materials, it is concluded that the lithography mechanism of protein lithography materials mainly relies on radiation to change the structure of the protein, so that its solubility changes in the developer to achieve lithography; and the natural polysaccharide lithography materials mainly rely on the introduction of photo-responsive groups to achieve lithography. Finally, the existing problems and development prospects of renewable lithography materials based on natural polymers are analyzed in this article.

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History
  • Received:April 07,2021
  • Revised:June 01,2021
  • Adopted:June 02,2021
  • Online: August 05,2021
  • Published: